magnetron plasma sputtering coater sputter Photos Catalog - page 8 - WorldBid B2B Market
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We Offer Sputtering TargetsChemicals - Shenzhen Konik Industries Co.,Ltd - China - November 13, 2012 - contact company for price
KONIK INDUSTRIES produces many types of sputter targets of which characteristics are homogeneous in elemental composition, high purity, size and density. Metal Targets Purity g/cm3 Size Ag 3N min 10.50 dia60, dia2'' Al 3N-5N 2.7 dia2'', dia3'' Au 4N-...
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Sio2 Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - September 7, 2012 - contact company for price
The Ceramic sputtering targets are : MgO, MgF2, Nb2O5 Al2O3, ZAO, ZNO, ZGO, ZBO, ITO, LaAlO3, LiNbO3, LiTaO3, SiO, SrTiO3, SiO2, SiC, , TiO2, Ta2O5, ZnO, ZrO2, . ZrO2-Y2O3 stabilized (YSZ), CeO2 , Nd2O3, Dy2O3, Gd2O3, Lu2O3, Y2O3, Yb2O3, NdF3, YF3, Y...
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Cds Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Key word: CdS; sputtering target Name: Cadmium sulfides (CdS) sputtering target film Molecular formula: CdS Color: Yellow Brand Name: CRM Purity: 99.999%min biggest size: Disc 18 inch (457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300m...
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Tiox Sputtering TargetChemicals - Oxide - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Titanium Oxide Sputtering Targets (TiOx target)(For DC sputter) film Name: Titanium Oxide (TiOx) sputtering target Molecular formula: TiOx Color: black Brand Name: CRM Purity: 99.99%min biggest size: Disc 18 inch (457.2mm) diameter 450mm...
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Ta2o5 Sputtering TargetsChemicals - Oxide - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Keywords:Tantalum pentoxide, Ta2O5 sputtering targets; Ta2Ox sputtering target; Ta2O5 film Name: Tantalum pentoxide, Ta2O5 sputtering targets, Ta2Ox sputtering target Molecular formula: Ta2O5 , Ta2Ox Color: black Brand Name: CRM Purity: 99.99%min big...
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Monb Sputtering TargetMetals - Alloy Steel - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Molybdenum Niobium sputtering target Molecular formula: Mo(90)Nb(10)wt%, MoNb Color: black Brand Name: CRM Purity: 99.95%min biggest size: Disc 18 inch (457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative De...
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Rotation Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - November 14, 2012 - contact company for price
Sputtering Targets Materials list: A, Metal Sputtering Targets: Aluminum (Al), Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), ...
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Plasma PenGeneral Agriculture - Guangzhou Beauty and Health Electronic Co.,Ltd - China - November 26, 2019 - contact company for price
Plasma lift pen is used for eyelid wrinkles removal. It can be divided into three kinds: plasma pen eye lift, medical plasma pen and jett plasma pen. Medical plasma pen has the function of neck lifting, eyelid lifting, acnes treatment and so on. Jett...
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Four Inch Anti Corrosion Heating Spin Coater With Gold Plated Sample Stage And Vacuum ChucksEquipment - Scientific - Zhengzhou CY Scientific Instrument Co., Ltd. - China - November 25, 2020 - 8600.00 Dollar US$
This product is a spin coater, also known as the spin processor, which uses centrifugal force generated by high-speed rotation to coat film materials. This model adopts a special design, so that the substrate can be heated simultaneously during the s...
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Molybdenum Sulfide Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Molybdenum Sulfide (MoS2) sputtering target flim Molecular formula: MoS2 Color: black Brand Name: CRM Purity: 99.9%min biggest size: Disc 18 inch (457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density:...
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Sputtering Targets Nife Mgf2Electronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - September 7, 2012 - contact company for price
As a major supplier of materials, Leadmat Advanced Materials Co., Ltd can offer a widly kinds of raw materials and products.include sputtering targers, evaporation materials, high pure materials, rare earth materials and advanced materials. Sputterin...
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Cuga Alloys Sputtering TargetMetals - Copper - Alloys - Changsha Xinkang Advanced Materials Co,Ltd - China - April 25, 2017 - 10.00 Dollar US$
Metal alloy targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi Specification: Densi ty: Hi-density Error: Min-error Purity: 99.9%-99.9995% Shapes: rings, circular, rectangular, cathode, Custom-made Size: supp...
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Titanium Nitride Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Titanium Nitride (TiN) sputtering target flim Molecular formula: TiN Color: gold color Brand Name: CRM Purity: 99.5%min biggest size: Disc 18 inch (457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density...
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Optical Coatings And Sputtering TargetChemicals - Dioxide - Shanghai Spark Advanced Material Co., Ltd - China - November 12, 2019 - contact company for price
Shape Size Color Purity Package Granule 1~3mm Colorless 99.99% 1000g 2~4mm 3~5mm Rod Φ2x2mm Φ3x3mm Sphere 2.5mmD Circular Φ25x10mm Φ30x12mm Silicon Monoxide(SiO) granule;1~3mm;2~4mm;3~5mm ;8~40mm;99.99% Silicon Dioxide(SiO2) granule;1~3mm;2~4mm;3~5mm...
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Titanium Dioxide Sputtering TargetChemicals - Dioxide - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Product name: Titanium Dioxide (TiO2) Sputtering Targets film Purity---99.9%, 99.95%, 99.99% Refractive index --- 2.5-2.9 Shape--- Discs, Plate, Step (Dia≤200mm, Thickness≥1mm) Rec tangle, Sheet, Step (Length≤300mm, Width≤200m...
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Planar Alloy Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for price
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to...
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Molybdenum Niobium Sputtering TargetMetals - Molybdenum - China Rare Metal Material Co., Ltd - China - October 29, 2013 - contact company for price
Name: Molybdenum Niobium sputtering target Molecular formula: Mo(90)Nb(10)wt%, MoNb Color: black Brand Name: CRM Purity: 99.95%min biggest size: Disc 18 inch (457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative De...
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Sputtering Target Zinc OxideComponents - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for price
Ceramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Rotary Metal Sputtering TargetsGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for price
Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various pu...
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Tungsten Carbide Sputtering TargetAutomobiles - Advanced Targets Materials Co., Ltd - China - January 2, 2025 - 1.00 Dollar US$
Tungsten Carbide A Tungsten Carbide Sputtering Target is a high-performance material commonly used in thin-film deposition processes, particularly in physical vapor deposition (PVD) applications. These sputtering targets are composed of tungsten carb...