6 Canada 
5 Germany 
1 Turkey 
1 UK 
1 China 
1 Czech Republic 
1 Korea 
ito sputtering target Photos Catalog - page 3 - WorldBid B2B Market
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Tungsten Sputtering TargetMetals - Tungsten - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceMetal Sputtering Targets: Aluminum (Al), Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, C...
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Molybdenum Sputtering TargetMetals - Molybdenum - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceMetal Sputtering Targets: Aluminum (Al), Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, C...
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Aluminum Sputtering TargetMetals - Aluminum - Changsha Xin Kang Advanced Materials Corporation. - China - June 6, 2016 - 50.00 Dollar US$Products: Metal sputtering targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W, Re, Au, Gd, Tb, Dy, Yb, Ce, Nb, Sm Metal alloy sputtering targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe,...
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Titanium Dioxide Sputtering TargetChemicals - Dioxide - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for priceProduct name: Titanium Dioxide (TiO2) Sputtering Targets film Purity---99.9%, 99.95%, 99.99% Refractive index --- 2.5-2.9 Shape--- Discs, Plate, Step (Dia≤200mm, Thickness≥1mm) Rec tangle, Sheet, Step (Length≤300mm, Width≤200m...
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Tungsten Carbide Sputtering TargetAutomobiles - Advanced Targets Materials Co., Ltd - China - January 2, 2025 - 1.00 Dollar US$Tungsten Carbide A Tungsten Carbide Sputtering Target is a high-performance material commonly used in thin-film deposition processes, particularly in physical vapor deposition (PVD) applications. These sputtering targets are composed of tungsten carb...
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Molybdenum Niobium Sputtering TargetMetals - Molybdenum - China Rare Metal Material Co., Ltd - China - October 29, 2013 - contact company for priceName: Molybdenum Niobium sputtering target Molecular formula: Mo(90)Nb(10)wt%, MoNb Color: black Brand Name: CRM Purity: 99.95%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative De...
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Cuga Alloy Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - November 4, 2014 - contact company for priceAlloy Sputtering Targets: AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlVMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB , CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn,...
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Optical Coatings And Sputtering TargetChemicals - Dioxide - Shanghai Spark Advanced Material Co., Ltd - China - November 12, 2019 - contact company for priceShape Size Color Purity Package Granule 1~3mm Colorless 99.99% 1000g 2~4mm 3~5mm Rod Φ2x2mm Φ3x3mm Sphere 2.5mmD Circular Φ25x10mm Φ30x12mm Silicon Monoxide(SiO) granule;1~3mm;2~4mm;3~5mm ;8~40mm;99.99% Silicon Dioxide(SiO2) granule;1~3mm;2~4mm;3~5mm...
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Molybdenum Sulfide Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for priceName: Molybdenum Sulfide (MoS2) sputtering target flim Molecular formula: MoS2 Color: black Brand Name: CRM Purity: 99.9%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density:...
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Titanium Nitride Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Titanium Nitride (TiN) sputtering target flim Molecular formula: TiN Color: gold color Brand Name: CRM Purity: 99.5%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density...
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Planar Alloy Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to...
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Sputtering Target Zinc OxideComponents - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for price
Ceramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Nickel Chromium Sputtering TargetMetal Manufacturing - Changsha Xinkang Advanced Materials Co,Ltd - China - May 2, 2017 - 20.00 Dollar US$
Product Name Nickel Chromium Sputtering Target, Pure Metal Sputtering Target, Manufacturer Metal Sputtering Target, Low price Manufacturer Metal Sputtering Target Element Symbol Ni + Cr Purity 3N, 3N6, 4N Availble Shape Planar target, Rotary target S...
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Rotary Ceramic Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various ...
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Aluminum Oxide Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - November 14, 2012 - contact company for price
Ceramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Cuga Alloys Sputtering TargetMetals - Copper - Alloys - Changsha Xinkang Advanced Materials Co,Ltd - China - April 25, 2017 - 10.00 Dollar US$Metal alloy targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi Specification: Densi ty: Hi-density Error: Min-error Purity: 99.9%-99.9995% Shapes: rings, circular, rectangular, cathode, Custom-made Size: supp...
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Planar Ceramic Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various ...
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Lanthanum Hexaboride Lab6 Sputtering TargetGeneral Metals - China Rare Metal Material Co., Ltd - China - October 29, 2013 - contact company for priceName: Lanthanum Hexaboride(LaB6) sputtering target film, Lanthanum Hexaboride(LaB 6) Cathode, Lanthanum Hexaboride(LaB6) crystal Molecular formula: LaB6 Color:Purple Brand Name: CRM Purity: LaB6 99.5%min, LaB6 99.9%min biggest size: Disc 18 inch (457...
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High Purity Nickel Ni Sputtering TargetMetals - Nickel - Changsha Xin Kang Advanced Materials Corporation. - China - June 13, 2016 - 50.00 Dollar US$The metal alloy sputtering targets XK produced are including Nickel Alloy Sputtering Targets, Iron Alloy Sputtering Targets, Cobalt Alloy Sputtering Targets, Copper Alloy Sputtering Targets and Aluminium Alloy Sputtering Targets, with purities from 9...
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High Purity Cobalt Co Sputtering TargetMetals - Cobalt - Changsha Xin Kang Advanced Materials Corporation. - China - June 20, 2016 - 50.00 Dollar US$Product Name:Cobalt Sputtering Target Element Symbol:Co Purity:3N5 Avai lble Shape:Planar target, Rotary target Metal sputtering targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W,...