7 Russia 
4 Singapore 
2 UK 
2 France 
1 Finland 
1 Hong Kong 
germanium sputtering target Photos Catalog - page 3 - WorldBid B2B Market
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Cuga Alloys Sputtering TargetMetals - Copper - Alloys - Changsha Xinkang Advanced Materials Co,Ltd - China - April 25, 2017 - 10.00 Dollar US$Metal alloy targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi Specification: Densi ty: Hi-density Error: Min-error Purity: 99.9%-99.9995% Shapes: rings, circular, rectangular, cathode, Custom-made Size: supp...
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Nickel Chromium Sputtering TargetMetal Manufacturing - Changsha Xinkang Advanced Materials Co,Ltd - China - May 2, 2017 - 20.00 Dollar US$Product Name Nickel Chromium Sputtering Target, Pure Metal Sputtering Target, Manufacturer Metal Sputtering Target, Low price Manufacturer Metal Sputtering Target Element Symbol Ni + Cr Purity 3N, 3N6, 4N Availble Shape Planar target, Rotary target S...
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Ito Target Granules SputteringMetals - Other - King Metal Industrial Limited - China - May 2, 2013 - contact company for priceITO target，ITO, high density We can also supply of ITO granules, Indium ingot, Indium foil, Indium wire, Indium beads, Indium powder, AZO Target, IGZO Target etc. Our products and services are as below: 1, High purity and Stable quality. ITO P...
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Sputtering Target Zinc OxideComponents - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for price
Ceramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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High Purity Nickel Ni Sputtering TargetMetals - Nickel - Changsha Xin Kang Advanced Materials Corporation. - China - June 13, 2016 - 50.00 Dollar US$The metal alloy sputtering targets XK produced are including Nickel Alloy Sputtering Targets, Iron Alloy Sputtering Targets, Cobalt Alloy Sputtering Targets, Copper Alloy Sputtering Targets and Aluminium Alloy Sputtering Targets, with purities from 9...
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High Purity Cobalt Co Sputtering TargetMetals - Cobalt - Changsha Xin Kang Advanced Materials Corporation. - China - June 20, 2016 - 50.00 Dollar US$Product Name:Cobalt Sputtering Target Element Symbol:Co Purity:3N5 Avai lble Shape:Planar target, Rotary target Metal sputtering targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W,...
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Lanthanum Hexaboride Lab6 Sputtering TargetGeneral Metals - China Rare Metal Material Co., Ltd - China - October 29, 2013 - contact company for priceName: Lanthanum Hexaboride(LaB6) sputtering target film, Lanthanum Hexaboride(LaB 6) Cathode, Lanthanum Hexaboride(LaB6) crystal Molecular formula: LaB6 Color:Purple Brand Name: CRM Purity: LaB6 99.5%min, LaB6 99.9%min biggest size: Disc 18 inch (457...
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Cadmium Sulfides Cds Sputtering Target FilmChemicals - Sulfide / Sulfate - China Rare Metal Material Co., Ltd - China - November 26, 2013 - contact company for priceName: Cadmium sulfides (CdS) sputtering target film Molecular formula: CdS Color: Yellow Brand Name: CRM Purity: 99.999%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density: ...
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Nickel Sputtering Target Rhenium Cerium CobaltMetals - Nickel - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceMetal Sputtering Targets: Aluminum (Al), Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, C...
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Ito Sputtering Target Mose2 Y2o3 Pbzro3Electronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceCeramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Titanium Sputtering Target Gadolinium Samarium CadmiumMetals - Titanium - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceMetal Sputtering Targets: Aluminum (Al), Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, C...
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Nickel Sputtering Target Pure 5977282 ShinnyMetals - Titanium - Bango Alloy Technologies Co., Ltd. - China - September 7, 2012 - contact company for price
Available grades for nickel target: Pure nickel Ni-Cr alloy Ni-V alloy Precisely machined / ground, shinny bright surface Roughness Ra 1.6, 0.8 Circular / planar / tubular Custom-made form as per drawing Joanna Market ing Sales Bango Alloy Technologi...
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Copper Indium Gallium Selenium Sputtering TargetGeneral Metals - China Rare Metal Material Co., Ltd - China - December 31, 2013 - contact company for priceName: Copper Indium Gallium Selenium sputtering target film Molecular formula: CuInxGa1-xSe2, CuIn0.7Ga0.3Se2 Color: black Brand Name: CRM Purity: CIGS 99.999%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360m...
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Copper Sputtering Target Nife Bond Nd2o3Components - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceSputtering Targets:the targets include metal sputtering targets, alloy sputtering targets, and ceramic sputtering targets.in this field Leadmat also can supply back plate and bond's serving, production list: Metal Sputtering Targets or rare earth met...
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Azo Sputtering Target Y3al5o12 Alf3 CigsComponents - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for priceCeramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Yttrium Barium Copper Oxide Ybco Sputtering Target 99General Electronics - SMART GLOBAL GROUP LIMITED - China - November 22, 2015 - contact company for price
Yttrium Barium Copper Oxide ( YBCO) Sputtering Target 99.99% YBCO( YBa2Cu3O7) Target Purity : 99.99% 1. YBCO( YBa2Cu3O7) Target ( wt% ) 99.99% min 2. ( Impurity Content) : PPmmin Element: Fe Pb Cr Ni Sr Ti Mn Zn K Na Ca Al Nb Mg Zr Si Content: 6 5 5 ...
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Single Target Rf Magnetron Sputtering Coating Equipment For LaboratoryEquipment - Scientific - Zhengzhou CY Scientific Instrument Co., Ltd. - China - November 25, 2020 - 20000.00 Dollar US$Single target RF Magnetron sputtering coating equipment is a special laboratory coating machine developed by our company. The equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to p...
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Three Target Heads Magnetron Sputtering Coater With Rf And Dc Power SupplyChemical Processing - Zhengzhou CY Scientific Instrument Co., Ltd. - China - June 15, 2020 - 32000.00 Dollar US$Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. ...
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High Pure Nickel Magnetron Sputtering Target Chinese ManufacturerGeneral Chemical - Achemetal Tungsten & Molybdenum Co Ltd - China - January 28, 2019 - contact company for priceSputtering is an advanced film material preparation technology. By the technology, ions generated by ion sources are gathered into high-speed ion flow at the accelerated speed in vacuum to impact solid surfaces, and ions are subjected to kinetic ener...
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Dual Bottom Target Dc Rf Magnetron Sputtering Coating Machine For LaboratoryEquipment - Scientific - Zhengzhou CY Scientific Instrument Co., Ltd. - China - November 25, 2020 - 38000.00 Dollar US$CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. It is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive fil...