Titanium Nitride Sputtering Target - China

Name: Titanium Nitride (TiN) sputtering target flim

Molecular formula: TiN

Color: gold color

Brand Name: CRM

Purity: 99.5%min

biggest size: Disc 18 inch （457.2mm) diameter

450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm

Relative Density: 90%min

produce way: hot pressing

Production Capacity: about 1000kg per month

The products include special ceramics, elemental metals, alloys, semiconductor compounds

and a variety of complex new materials (purity from low to high, up to 99.99999%), especially

magnetron sputtering targets, vacuum coating materials, high-purity compound semiconductor

materials, distilled rare earth metals, rare earth alloys, rare earth fluoride and special alloys

have great advantages.

Company Contact:

• Posted By: China Rare Metal Material Co.,Ltd.

• Phone: 008679188101311

• Address: Unit 1208-1212,HongGu JingDian Building, No.1376 H, Nanchang City, China

• Email:

• Website: http://www.china-raremetal.com

• Business Description: China Rare Metal Material Co., Ltd(CRM) established in 2004 year,
  
  locate in China Mainland; With two large fully equipped factories, two sales companies.
  
  CRM (China Rare Metal Material Co., Ltd.) Focus on export international market
  
  HaiTe (Jiangxi HaiTe Advanced Material Co., Ltd.) Focus on only China market
  
  KeTai ( Jiangxi Ketai Advanced Materials Co., Ltd.) Focus on manufacture
  
  CRM specializes in production, R&D of new materials and products.
  
  Taking the market as
  
  guidance, talents and technology as base, in order to meet urgent needs of new materials at
  
  home and abroad, we adjust product structure and production process internally and keep up
  
  with market s trends externally.
  
  As a company with strong comprehensive power and
  
  flourishing prospects, we are continuously researching and developing new materials and
  
  products applicable to current needs.
  
  The products include special ceramics, elemental metals, alloys, semiconductor compounds
  
  and a variety of complex new materials (purity from low to high, up to 99.99999%), especially
  
  magnetron sputtering targets, vacuum coating materials, high purity compound semiconductor
  
  materials, distilled rare earth metals, rare earth alloys, rare earth fluoride and special alloys
  
  have great advantages.