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Pe Cvd Plasma Enhanced Chemical Vapor Deposition Double Tube Furnace - China
price: contact company for price
PE-CVD (Plasma Enhanced Chemical Vapor Deposition) Double Tube Furnace
PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" or 3.14" O.
D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump.
The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:
Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si: H) deposition.
Company Contact:
- Posted By: HENAN SYNTHE CORPORATION
- Phone: 86-371 6939 2107
- Address: No. 12 Shangwu Waihuan Road, Zhengzhou, China, Zhengzhou , Henan , China
- Email:
- Website: http://www.syn-thermal.com
Published date: November 28, 2016
- Business Description: Henan Synthe Corporation Focuses on the manufacture of the high temperature furnace and relevant refractory materials, offers a series of tube furnace and box furnace.
These furnaces also offer atmosphere and vacuum control, specializing in high temperature function, including high temperature box and tube furnaces ranging from small laboratory furnaces to large production scale kilns.
We also offer furnace spare parts, such as complete SiC and MoSi2 heating elements, Alumina crucibles, ceramic fibre products.
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