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  • Three Sputter Sources 300w Rf Magnetron Sputtering Coater For The Preparation Of Non Metal Films - China

    price: 31500.00 Dollar US$

    Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company.

    It is standardized, modular and customizable.

    There are 1-inch or 2-inch magnetron targets for you to choose.

    Customers can choose the target according to the size of the substrate to be coated.

    The device is equipped with three 300W RF power supply.

    The RF power supply can be used for the preparation of non-metal.

    The three targets can meet the needs of multi-layer or multiple coatings.

    If customers have other coating needs, DC power supply and pulse power supply can be customized.

    Various types of power supply are available from 300W to 1000W in various specifications.

    The coating machine is equipped with two-channel high-precision mass flowmeter.

    If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.

    The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

    Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.

    This product can be equipped with an integrated industrial computer to control the system.

    In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

    Three targets RF magnetron sputtering coater application:

    This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like.

    Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

    Please contact us by email for details.


    Company Contact:


    • Phone: +86 37155199322

    • Address: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, zhengzhou , HeNan , China

    • Email: Email


    Published date: June 17, 2020

    • Business Description: Our mainlyproducts include high temperature furnace,include 1200/1400/1700 degree muffle furnace,1200/1400/1700 degree tube furnace, dental furnace, vacuum furnace,gold melting furnace, SiC heating element, MoSi2 heating element, alumina tubes and crucibles, and etc.

      We have our own manufacturing base factory as while as many sub-contracting factories, which enable us a reliable manufacturing ability and quality control system.

      We are capable of supplying both the equipment and technologies according to customers' different requirements and realities, and we have lots of successful projects in many different countries and regions, like East Europe, South Asia, South America, Australia and New Zealand, and Africa.

      "Profession, Quick Response, Hard Work, and Sincerity" is the strength of our team, earning us a sound reputation among our clients.

      We are open and willing to work with clients from different countries and regions.

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