Sputtering Targets For Flat Panel Display - China
price: contact company for price
China Rare Metal Material Co., Ltd produce kinds of sputtering targets
for flat panel display as below:
Alumina doped Zinc Oxide sputtering targets (AZO),
Tin doped indium Oxide sputtering target (ITO)
Niobium Oxide sputtering target(Nb2O5, NbOx)
Magnesium fluoride sputtering target (MgF2)
Molybdenum Niobium sputtering target (MoNb), Mo(90)Nb(10)wt%
Antimony dopedTin Oxide sputtering target , ATO(Sb2O3: SnO2)
Silicon sputtering target (Si)
Silicon Aluminum sputtering target (SiAl)
Titanium Oxide sputtering target (TiOx, TiO2, TiO )
Niobium doped Titanium Oxide sputtering target (TiOxNb)
biggest size: Disc 18 inch(457.2mm) diameter
Rectangle : 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm
Relative Density: 99%min
produce way: hot pressing
Production Capacity: about 1000kg per month
Company Contact:
- Posted By: China Rare Metal Material Co.,Ltd.
- Phone: 008679188101311
- Address: Unit 1208-1212,HongGu JingDian Building, No.1376 H, Nanchang City, China
- Email:
- Website: http://www.china-raremetal.com
Published date: November 30, 2013
- Business Description: China Rare Metal Material Co., Ltd(CRM) established in 2004 year,
locate in China Mainland; With two large fully equipped factories, two sales companies.
CRM (China Rare Metal Material Co., Ltd.) Focus on export international market
HaiTe (Jiangxi HaiTe Advanced Material Co., Ltd.) Focus on only China market
KeTai ( Jiangxi Ketai Advanced Materials Co., Ltd.) Focus on manufacture
CRM specializes in production, R&D of new materials and products.
Taking the market as
guidance, talents and technology as base, in order to meet urgent needs of new materials at
home and abroad, we adjust product structure and production process internally and keep up
with market s trends externally.
As a company with strong comprehensive power and
flourishing prospects, we are continuously researching and developing new materials and
products applicable to current needs.
The products include special ceramics, elemental metals, alloys, semiconductor compounds
and a variety of complex new materials (purity from low to high, up to 99.99999%), especially
magnetron sputtering targets, vacuum coating materials, high purity compound semiconductor
materials, distilled rare earth metals, rare earth alloys, rare earth fluoride and special alloys
have great advantages.
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