Best Cinnamoyl Chloride - China

Application:

Used as an intermediate in organic synthesis for the determination of trace moisture.

This product can be used as an intermediate in organic synthesis.

Cinnamamide can be prepared by amidation, and n-cinnamyl -nphenylhydroxylamine can be prepared by interaction with phenylhydroxylamine.

Cinnamyl chloride can also be used to synthesize the anti-inflammatory and analgesic drug Sinnoxicam (cinnoxicam) and other fine chemicals.

A reagent for the determination of trace water.

Production preparation:

Cinnamyl chloride is obtained by the reaction of sodium cinnamate with acetyl chloride.

The acetyl chloride and benzene are mixed into solution, and the dried sodium cinnamate is added several times under stirring from time to time.

After each addition, the carbon dioxide is released and the next time is added.

Then reflux for 2 hours.

After a little cooling, the resulting sodium chloride and trace unreacted sodium cinnamate are filtered out.

The filtrate was distilled to remove benzene at atmospheric pressure and then distilled at 131C (1.47kPa) to obtain the product in 75-90 yield.

Carbon tetrachloride can be recrystallized when purification is needed.

Cinnamyl chloride was prepared by the reaction of cinnamic acid with dichloro sulfoxide.

Polyvinyl cinnamate adhesive (PVAC, ) is a linear polymer compound with molecular weight of 15000 ~ 20 000, which is obtained by esterification of polyvinyl alcohol and cinnamyl chloride.

The photosensitive adhesive was prepared by adding 5-nitroacenaphthene and organic solvent cyclohexanone, that is, the double bond of the molecule was opened and solidified under ultraviolet light irradiation.

It has important applications in the manufacture of integrated circuits and micro components.

A photoresist, polyvinyl cinnamate, synthesized from polyvinyl alcohol and cinnamyl chloride in a pyridine solvent.

The prepared photoresist is called KPR.

The photochemical dimerization of the double bond of cinnamate was formed under the action of ultraviolet light, and it was turned into an insoluble substance.

KPR was the first photoresist used in photolithography, and 5-nitroacenaphthene was usually added as Guang Min.

Photoresist, also known as photoresist, can be used in photolithography, which is widely used in printing and electronic industry.

Its working principle is that the light part is crosslinked to form the insoluble hardening film, which is processed into negative image (negative glue), or the original insoluble glue becomes soluble after illumination, and is processed as a positive image (positive glue).

Company Contact:

• Posted By: Wuhan LANDMARK Industrial Co., Ltd.

• Phone: 02783916065

• Address: Jiang'an District of Wuhan, Wuhan , Hubei , China

• Email:

• Website: https://www.landmarkind.com

• Business Description: The company's main products are: cinnamic acid, cinnamaldehyde, cinnamon alcohol, methyl cinnamate, ethyl cinnamate, benzaldehyde and so on.
  
  The company has passed ISO9001 quality management system certification, and relying on the concept of independent development and joint development of universities, it has in-depth cooperation with major universities and scientific research institutions in Wuhan.
  
  It has successively obtained excellent companies with integrity standards, top ten outstanding private enterprises, and corporate credit evaluation AAA.
  
  Grade credit companies, etc.