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Tungsten Carbide Sputtering Target - China
price: 1.00 Dollar US$
Tungsten Carbide
A Tungsten Carbide Sputtering Target is a high-performance material commonly used in thin-film deposition processes, particularly in physical vapor deposition (PVD) applications.
These sputtering targets are composed of tungsten carbide (WC), a dense and hard ceramic compound known for its excellent properties.
Tungsten carbide is a compound composed of tungsten and carbon.
Its molecular formula is WC and its molecular weight is 195.85 - Tungsten Carbide Sputtering Target
Tungsten carbide is a compound composed of tungsten and carbon.
Its molecular formula is WC and its molecular weight is 195.85 - It is a black hexagonal crystal with metallic luster and similar hardness to diamond.
It is a good conductor of electricity and heat.
Tungsten carbide is insoluble in water, hydrochloric acid and sulfuric acid, but easily soluble in the mixed acid of nitric acid and hydrofluoric acid.
Pure tungsten carbide is fragile, if a small amount of titanium, cobalt and other metals are added, the brittleness can be reduced.
Tungsten carbide, which is used as steel cutting tool, is often added with titanium carbide, tantalum carbide or their mixture to improve the antiknock ability.
The chemical properties of WC are stable.
Tungsten carbide powder is used in cemented carbide production.
Company Contact:
- Posted By: Advanced Targets Materials Co., Ltd
- Phone: 13810586569
- Address: No.9 Keyuan Road, High Tech Industrial Development Zone, Zhuozhou City, HeBei, China, Zhuozhou , HeBei , China
- Email:
- Website: https://www.atargets.com/
Published date: January 2, 2025
- Business Description: Advanced Targets Materials Co., Ltd is one of the leading manufacturers of sputtering targets, arcing cathodes and evaporation materials for the PVD thin film companies worldwide.
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